PROTECTIVE COATINGS
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Introduction to Wet Etching of Silicon
Wet etching uses KOH, TMAH, or other alkaline etchants
Wet etching results in an anisotropic etch along the silicon crystal plane
An etch protective mask is required during wet silicon etching
Oriented wafers are commonly used
Protek_Materials
WET ETCHING PROCESSES ARE USED TO FABRICATE MANY COMMERCIAL DEVICES:
Pressure Sensors
MEMS Microphones
MEMS Accelerometers
High-Brightness LEDs
Microfluidic Devices
Advanced IC Packaging
All Brewer Science® protective coatings allow micromachining to take place closer to packaging, which simplifies the processes and improves device yield. The low-temperature processing of these films allows them to be coated over CMOS structures, unlike SiO2 or SiN layers.
protek_spin_applied
Protective coatings also allow the release of membranes and proof masks and the creation of through-silicon vias (TSVs) as a last step before packaging. This capability improves the process and device yield.
Brewer Science lithography products have been shaping the semiconductor industry since 1981. Over the years, new product lines, capabilities, and specifications have been improved to deliver the best performance to our customers. Focusing on improving quality and manufacturing efficiencies, we have become the go-to supplier of next-generation lithography materials.
lithography - microchip
Anti-reflective Coatings
Anti-reflective Coatings the original bottom anti-reflective coatings (BARCs), ARC® anti-reflective coatings continue to be the industry benchmark for reflection control and light absorption during photolithography.
193-nm materials for negative tone develop (NTD) and positive tone develop (PTD) processes
DUV materials
i-line materials
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Multilayer Systems
Multilayer Systems used in combination with our proprietary OptiStack® optical modeling system to achieve the finest resolutions possible with 193-nm immersion lithography.
Silicon polymer hardmasks for negative tone develop (NTD) and positive tone develop (PTD) processes
Spin-on-carbons (SOCs)
High-temperature-stable SOCs for post-lithography deposition processes
Silicon polymer gap-filling materials
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Extreme Ultraviolet (EUV)
EUV assist underlayers that enable faster development of EUV photoresist and processes
Organic assist layers for improved resist adhesion
Silicon polymer hardmasks for EUV etch integration
Metal-containing hardmasks for dose reduction and etch integration
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WORLD-CLASS MANUFACTURING
Brewer Science has put the resources and investments into manufacturing that are necessary to reach and achieve our customers’ goals. Our numerous cleanroom environments down to Class 10 help provide the cleanest and purest environments for manufacturing. Within these cleanrooms, we have built closed-loop systems utilizing state-of-the-art software for automating and monitoring our processes.
QUALITY PRODUCTS FOR QUALITY PEOPLE
The investments to our product improvements didn’t just stop at manufacturing product but continue into our quality control, quality engineering, analytical, and applications groups as well. Over the years we have improved the testing of our materials down to 1-part-per-trillion (1 ppt) and are working to achieve 1-part-per-quadrillion (1 ppq) results. To do this we use, and continue to invest in, leading edge analytical and process equipment.
