WaferX 310
In-line, simultaneous WDXRF spectrometer for wafer metal film metrology; up to 300 mm wafers
WDA-3650 product image
WDA-3650
Simultaneous WDXRF spectrometer for wafer metal film metrology; up to 200 mm wafers
AZX 400 wavelength dispersive XRF for large samples
AZX 400
Sequential WDXRF spectrometer for elemental analysis and thin-film metrology of large and/or heavy samples
MFM310 product image
MFM310
Process XRR, XRF, and XRD metrology tool for blanket and patterned wafers; up to 300 mm wafers
TXRF 3760 product image
TXRF 3760
Trace elemental surface contamination metrology by TXRF; up to 200 mm wafers.
TXRF 3800e product image
TXRF 3800e
Trace elemental surface contamination metrology by TXRF; up to 200 mm wafers.
Onyx Hybrid XRF and Optical metrology FAB tool
Onyx 3000
XRF and optical metrology tool for blanket and patterned wafers; up to 300 mm wafers
TXRF 310Fab product image
TXRF310Fab
Trace elemental surface contamination metrology by TXRF; up to 300 mm wafers
TXRF-V310 product image
TXRF-V310
Ultra-trace elemental surface contamination metrology by TXRF with VPD capability; up to 300 mm wafers
XHEMIS EX-2000
XHEMIS EX-2000
This versatile X-ray metrology tool enables high-throughput measurements on blanket wafers ranging from ultra-thin single-layer films to multilayer stacks for process development and film quality control.
