Founded in 2004, Arradiance combines unique talents in material science, charged particle physics, equipment design, modeling, simulation, vacuum technology, and metrology providing world class application of Atomic Layer Deposition(ALD) and Plasma Enhanced Deposition(PEALD) equipment and foundry services
Molecular InnovationTM – Enabling Technologies
for Our World and Beyond.
Systems for Atomic Layer Deposition, Foundry of Nanofilms and Technology Services in the field of ALD and Nanofilm. Supported markets are Energy storage, Medical devices, Solar PV, High Energy Physics, Semiconductor Research, Catalyst Research, Superconductors.
Thermal ALD System, GEMStar XT
PEALD System, GEMStar XT-xP
The Arradiance GEMStar product family provides high-quality ALD equipment in a compact benchtop platform.
We offer systems with one manifold including four precursor lines for pure thermal ALD, up to PEALD (Plasma Enhance Atomic Layer Deposition) systems with two manifolds, including eight precursors and up to 4 plasma gases.
To meet any budget, we offer cost-effective thermal ALD systems with the ability to be upgraded to high-end PEALD systems.
A Pulsed Vapor Push, suitable for low vapor pressure materials, is included in each system.
The GEMFlow software enables easy programming for complicated nanolaminate films and stores the history of all process and system parameters.
Data Sheet GEMStarXT
Data Sheet GEMStarXT-R
Data Sheet GEMStarXT-P
Options
Interface for Glovebox
Load Lock
Extra Precursor Bottle
Extra Material Heater Jackets
500ºC heated substrate Platen
Ebara Dry Pump
Kit for Ozone generation and abatement
Carrier for batch processing
Particle Coating, with rotational particle canister
QCM (Quartz Crystal Monitor).
GEMStar XT-R and GEMStar-XT-P integrated with Glovebox
Glove-Box Integration of GEMStar-XT-R and GEMStar-XT-P
Both, the GEMStar-XT-R and the GEMStar-XT-P are connected to a glovebox. The GEMStar is outside the Glovebox which has many advantages, for instance:
more space in the glovebox
the system is easier to maintain
uncomplicated precursor bottle exchange or refill
the sensitive glovebox atmosphere will be much less influenced by the thermal mass
Data Sheet GEMStar XT and XT-P GB Glovebox Interface
Data Sheet GEMStar XT MULTI-TRAP System
Heated Platen Option for GEMStar XT HPTM
This platen option was developed to enable our GEMStar System to reach hihger process temperatures.
With this platen, the substrate temperature can be increased to 450oC.
Data Sheet GEMStar XT HP
Load Lock Option for GEMStar XT LLTM
This Load Lock System is optimized to use
with the GEMStar XT Benchtop ALD Systems.
It enables the control of atmospheric exposure
of the process reactor and substrate
during exchange.
Data Sheet GEMStar XT-LL
Substrate holders for GEMStar XT-LL
To achieve maximum user flexibility, Arradiance has engineered a door mounted End Effector system option that allows “Tool less” change of substrate end effector holders and cassettes allowing the GEMStar XT system to process a wide range of standard substrates from Si wafers to Solar Cells.
• Data Sheet Endeffector System
Frontloading Tray-System for GEMStar XT-LL
Enabling thermal ALD processing of large substrates up to M12 Solar Panels, Arradiance has engineered a front-loading tray system. This system allows tool-less exchanges of Single Substrate End Effectors and Cassettes ranging from 100 mm Diameter to Solar M12 (210 mm Square) substrates
• Data Sheet Front-Loading Tray System
Particle Coater
Particle Coating Door Option for
GEMStar XT-LL
This option is designed for offering the GEMStar Benchtop ALD System the possibility to simultaneously coat particles and wafers both, on a desktop or in connection with a glovebox.
Data Sheet GEMStar XT Particle Coating Door Option
Precursor bottle and heater jacket
Precursor Bottle and Heater Jacket
Our Foundry Service
The inherent strengths of ALD technology are materials availability for much of the periodic table, conformality, ability to adapt to various substrates (from particles to wafers), uniformity, pinhole free, repeatability, robustness and scalability have created broad interest in many fields. Arradiance process and equipment technologies were forged in the most challenging ALD Nanofilm environment: electrically functional nanofilms on substrates possessing both high surface areas (>9m2) and high aspect ratios (>>100:1). Arradiance foundry services, grants customer access to the process, equipment and intellectual property that is at the core of the company.
Arradiance offers several methods described below to utilize our foundry services
A benefit working with Arradiance is the ability to transfer proven ALD processes to support pilot and full-scale production in house.
Rapid turn, ALD and MLD nanofilms
Arradiance foundry services offers a menu of standard nanofilm coatings, developed and used extensively for and by Arradiance and its customers. The Nanofilms available a la carte, include (but are not limited to): Al2O3, Ta2O5, Pt, HfO2, TiO2, Ru, MgO, Y2O3, WN, SiO2, ZnO, SnO2 and ZrO2. A more extensive, updated list is available from Arradiance Foundry services. In addition, Arradiance scientists possess extensive experience with nanolaminates and nanoalloys of these films, having developed, patented and licensed the first commercial ALD Nanofilms comprised of nanolaminates and nanoalloys.
Joint Developemnt Programs
Arradiance Foundry services works closely with customers to develop new, functional nanofilms that possess customer targeted attributes providing a wide range of technology solutions thanks to the unique capabilities of ALD.
Pilot and Volume Manufacturing
Following successful nanofilm development and testing, Arradiance offers multiple paths for Customers to include pilot manufacturing and on to full-scale production
Process Capability
Arradiance has significantly increased our Foundry capabilities to assist our customers in developing a broad range of materials and processing utilizing our GEMStar XT Systems. With a 500 SQ ft. clean room capable of class 1,000 performance. Arradiance is prepared to achieve performance required by most applications
ALD Precursor Capability
The inherent strength of ALD technology is precursor availability for much of the periodic table
Thermal and PEALD Reactive Gas Capability
N2, Ar, O2, O3, NH3, H
Arradiance is pleased to announce the addition of Hydrogen processing capability for our GEMStar systems and now available as part of Foundry services.
Reactor Gas Isolation Protocol (RGIP)
To ensure safe operating conditions, the Reactor Gas Isolation Protocol (RGIP) is designed to restrict simultaneous injection of reactive gasses into the GEMStar XT reactor.
The RGIP control system prevents unwanted mixing of gases providing safe operation in both manual and automated script processing.
Hydrogen Plasma using RGIP control
