With more than 50 years experience and more than 1000 systems installed within the Semiconductor furnace industry, Tempress provides a broad range of process applications from small batch special applications up to high volume fully automated high temperature oxidation and diffusion. Semi- or full automation available Diffusion & (LP)CVD processes Both for R&D and industrial scale processes.
Small Batch Vertical Furnace
The Small Batch Vertical Furnace (SBVF) can process wafers up to 200 mm
TS Series
The TS series is Tempress’ versatile horizontal furnace system that is configurable to meet our customer demands in the semiconductor, solar, MEMS and photonics industries
Automatic wafer handling
The furnace platforms for medium and high volume Semiconductor manufacturing can be equipped with integrated boat handler and storage and fully automated wafer handling systems.
SPECTRUM 200/300
The Spectrum 200/300 platform is designed for high temperature processing in the semiconductor power and MEMS industries.
Tempress has a long history of developing & delivering innovative high volume manufacturing solar furnaces to the solar market. Strong experience in diffusion in both POCl3 and BBr3 as well as annealing processes, have resulted in a demanding 40GW installed base. In CVD coating both PECVD and LPCVD applications are operating at most leading Tier1 manufacturers and institutes with lowest Cost of Ownership in the industry. For N-PERT and especially TopCon advanced solar cell manufacturing, Tempress is leading the market towards reliable high volume manufacturing.
SPECTRUM PECVD
Tempress SPECTRUM is a batch-type PECVD system for SiOx and SiNx deposition on silicon solar cells
SPECTRUM LPCVD Poly
The Tempress SPECTRUM LPCVD Poly system is used for in-situ oxide and poly deposition in a so-called ‘TopCon’ solar cell
SPECTRUM BBr3
The third generation of Tempress BBr3 systems uses the common Tempress SPECTRUM platform, thereby strengthening Tempress’ position as global leader in BBr3 diffusion furnaces.
SPECTRUM POCl3
Due to 40 years of experience, Tempress has established a POCl3 diffusion platform capable of delivering the most stable, reproducible and versatile process conditions at the lowest cost of ownership.
SPECTRUM ALD
SPECTRUM 5 stack batch ALD system with up to 1800 wafer load per tube for the highest throughput batch ALD system in the market. Cost effective solution for P-perc and advanced TOPCon emitter passivation.
